Semiconductor,
Display Equipment

Adsorption & Catalyst

The Gas Purification System providing sub-ppb performance is designed to remove impurities in a process gas through use of high qualified catalyst & adsorption. These materials provide wholly purification in using dual columns(vessels) without downtime. Two columns alternate between purification and regeneration modes. Outlet impurity levels are reduced to below sub-ppb. The AC series uses dual columns processes designed to provide ultra-high purified gases for semiconductor, flat panel display, LED and solar cell applications, as well as it can be manufactured from high flow rates of 5 to 10,000 Nm3/h
Gas Purified : Ammonia, Argon, Helium, Hydrogen, Nitrogen, Oxygen and Rare Gas (Kr, Ne, Xe), Special gases for HCl, Cl₂, CF₄, C₂F₆, SF₆, NH₃

특징

  • Safety Alarms and Interlock for High Temperature, Leakage, Over Pressurization
  • Hydrogen Blending(Mixer) Kit
  • Enhanced PLC Controller and electronics box designed for simple operation and reliability
  • All Metal Enclosure, 316L stainless steel electropolished wetted surface finish
  • Splendid Pre-heaters and Heat Exchanger
  • Closed-Loop System for Temperature



선택 사양


  • Removal of Methane(CH₄)

  • Moisture Analyzer

  • Auto or Manual Bypass manifold kit

  • MFM(Mass Flow Meter)

  • UPS(Uninterrupted Power Supply)

  • 0.003㎛ Metal Particle Filter

  • Isolation Valves and Pressure Transducers on downstream and upstream





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