XPS (Extreame Clean Dry Air Purification System)
The GL-XPS-N series is a state-of-the-art advancement in purification technology from Leaders and Global, providing for outlet purity in the ppt levels as removing gaseous contaminants such as volatile bases (NH₃), volatile acids (SO₂), condensable organics (Toluene), refractory compounds (HMDSO), moisture (H₂O) from CDA (air). The system delivers purified Extreme Clean Dry Air (XPS) gas not only to reticle and wafer stockers but also the latest scanner platforms, including ArF dry and immersion lithography equipment. It uses ambient temperature purification based on the in-situ regeneration technology, automatically self-regenerate and switch-over by using two columns as well as automatically purging and conditioning. As a result, this system improves safety and eliminates human error or environmental concerns.