Semiconductor,
Display Equipment

XPS (Extreame Clean Dry Air Purification System)

The GL-XPS-N series is a state-of-the-art advancement in purification technology from Leaders and Global, providing for outlet purity in the ppt levels as removing gaseous contaminants such as volatile bases (NH₃), volatile acids (SO₂), condensable organics (Toluene), refractory compounds (HMDSO), moisture (H₂O) from CDA (air). The system delivers purified Extreme Clean Dry Air (XPS) gas not only to reticle and wafer stockers but also the latest scanner platforms, including ArF dry and immersion lithography equipment. It uses ambient temperature purification based on the in-situ regeneration technology, automatically self-regenerate and switch-over by using two columns as well as automatically purging and conditioning. As a result, this system improves safety and eliminates human error or environmental concerns.

시스템 특성과 안전성

Contaminant removal efficiency ensures extreme clean process in ppt levels and low pressure drop as well as low cost of ownership with use of ambient temperatures where heating kit is not required. By system reliability, power failure will not damage the XPS. Optimized in-situ operation technology provides customers with automatically self-regenerate, guaranteeing a continuous flow of clean air gas and reduces interruptions to process gas flows. The system is designed for
easy installation, field service and upgrades.